Method for improving surface roughness of processed film of substrate and apparatus for processing substrate

ABSTRACT

A treatment apparatus for treating a substrate on a surface of which a treatment film has been formed and subjected to exposure processing and developing treatment. The treatment apparatus includes a nozzle for supplying a solvent gas of the treatment film to the surface of the treatment film on the substrate, and a moving mechanism for moving the nozzle which is supplying the solvent gas, relative to the substrate. The nozzle has an elongated discharge portion at least longer than a diameter of the substrate and partition plates at a front and a rear in the moving direction of the nozzle.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a division of U.S. application Ser. No. 10/559,332,filed May 30, 2006, which is the National Stage of PCT/JP2004/007486,filed May 31, 2004, and claims the benefit of priority of Japaneseapplication 2003-162054, filed Jun. 6, 2003. The entire contents of U.S.application Ser. No. 10/559,332, are incorporated herein by reference.

TECHNICAL FIELD

The present invention relates to a method of improving surface roughnessof a treatment film on a substrate and a substrate treatment apparatus.

BACKGROUND ART

In a photolithography process in a manufacturing process of asemiconductor device, for example, resist coating treatment in which aresist solution is applied onto a base film of a semiconductor wafer(hereinafter, referred to as a “wafer”) to form a resist film; exposureprocessing in which a predetermined pattern is exposed on the wafer;developing treatment in which the wafer after exposure is developed;etching treatment in which the base film or the like on the wafer isetched, and so on are performed, so that a predetermined circuit patternis formed on the wafer.

In the aforementioned exposure processing, light is applied to apredetermined portion of the flat resist film to change the solubilityof the exposed portion to a developing solution. In the developingtreatment, when the developing solution is supplied to the wafer, theresist film at the exposed portion is selectively dissolved and removed,if it is, for example, a positive-type resist, resulting in a desiredpattern of the resist film formed on the wafer. In the etchingtreatment, the base film being a lower layer is selectively etched withthe resist film in the aforementioned predetermined pattern functioningas a mask (see, for example, Patent Document 1).

[Patent Document 1]

Japanese patent Application Laid-open No. 2002-75854

Incidentally, on the surface of the resist film which has been subjectedto the aforementioned developing treatment, for example, a plurality ofhorizontal lines appear on the side wall surface as shown in FIG. 17,resulting in projections and depressions on the surface of the resistfilm R. This is conceivably caused by the wave property of light appliedfrom above the wafer during exposure processing.

DISCLOSURE OF THE INVENTION Problems to Be Solved by the Invention

The formation of projections and depressions on the surface of theresist film roughens the surface, thereby causing, for example,projections and depressions such as vertical lines corresponding to theaforementioned horizontal lines on the resist film to appear on the basefilm when the base film is subjected to etching treatment using theresist film as a mask. As a result of the appearance of projections anddepressions on the surface of the base film due to the formation of thevertical lines in the base film, a precise circuit pattern is no longerformed on the wafer, thus resulting in a failure to manufacture asemiconductor device with a desired quality. Particularly, in these dayswhen the circuit pattern has been made finer, even slight projectionsand depressions greatly affect the shape of the circuit pattern, andtherefore it is an important problem to improve the surface roughness ofthe resist film.

The present invention has been developed in consideration of the abovepoint and its object is to provide a method of improving surfaceroughness of a treatment film such as a resist film formed on asubstrate such as a wafer and a substrate treatment apparatus.

Means for Solving the Problems

To achieve the above object, the present invention is a method ofimproving surface roughness of a treatment film formed on a substrate,including the step of: after exposing and developing the substrate,supplying a solvent gas of the treatment film to a surface of thetreatment film to dissolve only the surface of the treatment film on thesubstrate. Note that the “dissolution” in this case means the state inwhich, for example, the solvent gas is absorbed, for example, in thetreatment film and the treatment film dissolves and swells.

According to the present invention, the solvent gas is supplied to thesurface of the treatment film on the substrate to dissolve only thesurface of the treatment film, so that the projections and depressionson the surface of the treatment film are leveled and thereby smoothed.Thereafter, by heating the substrate, for example, the treatment filmwhich has absorbed the solvent gas and thereby swelled is dried to beheat-shrunk. As a result, the surface of the treatment film isflattened, whereby the surface roughness of the treatment film can beimproved.

The method of improving surface roughness of a treatment film formed ona substrate may further include the step of, before the step ofsupplying the solvent gas to the surface of the treatment film,temperature-adjusting the substrate to a predetermined temperature. Thedegree of dissolution of the surface of the treatment film by the supplyof the solvent gas depends on the temperature. Therefore, thetemperature of the substrate adjusted to a predetermined temperaturebefore the supply of the solvent gas, thereby allowing only the surfaceof the treatment film to appropriately dissolve. Besides, since thetemperature within the substrate may become slightly uneven in thedeveloping treatment being the previous treatment, the temperature ofthe substrate can be adjusted to improve the uniformity in temperaturewithin the substrate, thereby dissolving evenly the surface of thetreatment film within the substrate.

Further, in the present invention, after exposing and developing thesubstrate, it is preferable that the solvent gas of the treatment filmis supplied to a region of a part of the surface of the substrate andthe region to be supplied with the solvent gas is moved, so that thesolvent gas is supplied to the entire surface of the treatment film.

According to the present invention, the solvent gas is being supplied toa region of a part of the surface of the substrate, while the supplyregion is being moved, so that the solvent gas in an appropriate amountto dissolve only the surface of the treatment film can be supplied tothe treatment film on the surface of the substrate.

It should be noted that when supplying the solvent gas of the treatmentfilm to the surface of the treatment film, the solvent gas of thetreatment film may be supplied from above the substrate toward theentire surface of the substrate.

Furthermore, in the present invention, after exposing and developing thesubstrate and before supplying the solvent gas of the treatment film tothe surface of the treatment film, a treatment step may be performed todecompose a protecting group inhibiting dissolution in the treatmentfilm. This allows the above-described smoothing effect to be implementedeven for a so-called ArF resist. The protecting groups to inhibitdissolution in the treatment film include, for example, a lactone group.

Examples of such a treatment to decompose the protecting groupinhibiting dissolution in the treatment film include irradiation ofultraviolet or electron beam.

The present invention is particularly useful in smoothing the resistfilm in the photolithography process. The usable solvent gas in thatcase is a vapor of each of acetone, propylene glycol monomethyl etheracetate (PGMEA), and N-methyl-2-pyrrolidinone (NMP). For more preferableusage, PGMEA is suitable for a resist film for KrF (having a wavelengthof 248 nm), and NMP is suitable for a resist film for ArF (having awavelength of 193 nm).

A substrate treatment apparatus of the present invention is a treatmentapparatus for treating a substrate on a surface of which a treatmentfilm has been formed and subjected to exposure processing and developingtreatment including a nozzle for supplying a solvent gas of thetreatment film to the surface of the treatment film on the substrate.

According to the present invention, after the treatment film is formedon the substrate and the substrate is subjected to exposure anddevelopment, the solvent gas can be supplied to the surface of thetreatment film on the substrate to dissolve only the surface of thetreatment film. This levels and smoothes the projections and depressionsformed on the surface of the treatment film, thereby improving thesurface roughness of the treatment film.

The substrate treatment apparatus may include a moving mechanism formoving the nozzle which is being the solvent gas, relative to thesubstrate. In this case, the nozzle is moved above the surface of thesubstrate, for example, with the nozzle discharging the solvent gas,whereby the solvent gas in an appropriate amount can be supplied to theentire surface of the treatment film. Accordingly, the solvent gas canbe supplied to the treatment film so as to dissolve only the surface ofthe treatment film.

The nozzle may have an elongated discharge portion at least longer thana diameter of the substrate. In this case, the nozzle is moved above thesubstrate from the one end side to the other end side of the substrate,whereby the solvent gas can be supplied onto the entire surface of thetreatment film formed on the substrate.

The substrate treatment apparatus may include a temperature-adjustingmechanism for adjusting a temperature of the substrate. Thistemperature-adjusting mechanism can adjust the temperature of thesubstrate, for example, before the solvent gas is supplied to thesubstrate. Since the dissolution of the treatment film by the solventgas is affected by the temperature, previous setting of the substrate toa predetermined temperature allows only the surface of the treatmentfilm to appropriately dissolve. Besides, since the temperature withinthe substrate can be made uniform, the dissolution within the treatmentfilm can be uniformly performed over the entire surface of thesubstrate.

The substrate treatment apparatus may include a heating mechanism forheating the substrate. In this case, after the solvent gas is suppliedto the surface of the treatment film on the substrate, the substrate canbe heat-dried and thereby heat-shrunk. It should be noted that thesubstrate treatment apparatus may include a developing treatmentmechanism for performing developing treatment for the substrate. In thiscase, the substrate can be developed, and thereafter the solvent can besupplied in the same unit.

The nozzle may have partition plates at a front and a rear of thedischarge portion, that is, at the front and the rear in the movingdirection of the nozzle. This can prevent the solvent gas dischargedfrom the discharge portion from diffusing to the surroundings, resultingin uniform supply of the solvent gas as a whole.

EFFECT OF THE INVENTION

According to the present invention, the surface roughness of thetreatment film on the substrate can be improved so that, for example, acircuit pattern having a predetermined dimension is formed on asubstrate, and, for example, subsequent etching treatment or the like ispreferably performed, resulting in improved yields.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1

A plan view showing the outline of a configuration of a coating anddeveloping treatment system in the present embodiment.

FIG. 2

A front view of the coating and developing treatment system in FIG. 1.

FIG. 3

A rear view of the coating and developing treatment system in FIG. 1.

FIG. 4

An explanatory view of a longitudinal section of a solvent supply unit.

FIG. 5

An explanatory view of a transverse section of the solvent supply unit.

FIG. 6

A perspective view showing the configuration of a solvent supply nozzle.

FIG. 7

An explanatory view of a longitudinal section showing the configurationof a heating unit.

FIG. 8

A flowchart showing a part of a processing process of a wafer.

FIG. 9

An explanatory view showing the appearance of change of a resist film.

FIG. 10

An explanatory view of a longitudinal section showing the configurationof a solvent supply unit with a heating mechanism.

FIG. 11

An explanatory view of a transverse section showing the configuration ofthe solvent supply unit with a developing treatment mechanism.

FIG. 12

An explanatory view of a longitudinal section showing the configurationof the solvent supply unit in FIG. 11.

FIG. 13

A graph showing changes in line width and LWR when a smoothing treatmentis performed by supply of solvent gas and a partially enlarged plan viewof a resist pattern.

FIG. 14

A side view of the solvent supply nozzle showing the appearance wherepartition plates are attached to the front and the rear of a dischargeportion of the solvent supply nozzle.

FIG. 15

An explanatory view of a longitudinal section of a treatment containerin which the solvent gas is supplied to the entire surface of the waferat a time.

FIG. 16

An explanatory view of a longitudinal section of a treatment unit havingan irradiation unit for ultraviolet or electron beam.

FIG. 17

An explanatory view showing projections and depressions on the surfaceof a resist film after the developing treatment.

EXPLANATION OF CODES

-   1 coating and developing treatment system-   19 solvent supply unit-   60 chuck-   70 exhaust cup-   83 solvent supply nozzle-   W wafer

BEST MODE FOR CARRYING OUT THE INVENTION

Hereinafter, a preferred embodiment of the present invention will bedescribed. FIG. 1 is a plan view showing the outline of a configurationof a coating and developing treatment system 1 incorporating a substratetreatment apparatus according to the present embodiment, FIG. 2 is afront view of the coating and developing treatment system 1, and FIG. 3is a rear view of the coating and developing treatment system 1.

The coating and developing treatment system 1 has, as shown in FIG. 1, aconfiguration in which, for example, a cassette station 2 for carrying,for example, 25 wafers per cassette as a unit from/to the outsideinto/from the coating and developing treatment system 1 and carrying thewafers W into/out of the cassette C; a processing station 3 includingvarious kinds of processing and treatment units, which are multi-tiered,for performing predetermined processing or treatments in a manner ofsingle wafer processing in coating and developing treatment processes;and an interface section 5 for transferring the wafers W to/from analigner 4 provided adjacent to the processing station 3, are integrallyconnected together.

In the cassette station 2, a plurality of cassettes C can be freelymounted at predetermined positions on a cassette mounting table 6 beinga mounting section in a line in an X-direction (a top-to-bottomdirection in FIG. 1). A wafer carrier 7, which is movable in acassette-arrangement direction (the X-direction) and in awafer-arrangement direction of the wafers W housed in the cassette C (aZ-direction; the vertical direction), is further provided along acarrier path 8 and thus can selectively access each of the cassettes C.

The wafer carrier 7 includes an alignment function of aligning the waferW. The wafer carrier 7 is configured, as described later, to be able toalso access an extension unit 32 included in a third processing unitgroup G3 on the processing station 3 side.

In the processing station 3, a main carrier unit 13 is provided at itscentral portion, and various kinds of processing and treatment units aremulti-tiered to constitute processing unit groups around the maincarrier unit 13. In this coating and developing treatment system 1, fourprocessing unit groups G1, G2, G3, and G4 are arranged. The first andsecond processing unit groups G1 and G2 are placed on the front side ofthe coating and developing treatment system 1, the third processing unitgroup G3 is placed adjacent to the cassette station 2, and the fourthprocessing unit group G4 is placed adjacent to the interface section 5.Further, as an option, a fifth processing unit group G5 shown by abroken line can be separately placed on the rear side. The main carrierunit 13 can carry the wafer W to the later-described various kinds ofprocessing and treatment units located in these processing unit groupsG1, G2, G3, G4, and G5. Note that the number and arrangement of theprocessing unit groups can be arbitrarily selected depending on the kindof processing to be performed on the wafer W.

In the first processing unit group G1, as shown in FIG. 2, for example,a resist coating unit 17 for applying a resist solution to the wafer Wto form a resist film on the wafer W and a developing treatment unit 18for developing the wafer W are two-tiered in order from the bottom. Inthe second processing unit group G2, a solvent supply unit 19 as asubstrate treatment apparatus according to the present embodiment and adeveloping treatment unit 20 are two-tiered in order from the bottom.

In the third processing unit group G3, as shown in FIG. 3, for example,a cooling unit 30 for cooling the wafer W, an adhesion unit 31 forenhancing adhesion between the resist solution and the wafer W, theextension unit 32 for transferring the wafer W, pre-baking units 33 and34 each for evaporating the solvent in the resist solution, a heatingunit 35 for heat-drying the wafer W supplied with the solvent gas, and apost-baking unit 36 for performing heating processing after thedeveloping treatment are, for example, seven-tiered in order from thebottom.

In the fourth processing unit group G4, for example, a cooling unit 40,an extension and cooling unit 41 for allowing the wafer W mountedthereon to naturally cool, an extension unit 42, a cooling unit 43,post-exposure baking units 44 and 45 each for performing heatingprocessing after exposure, a heating unit 46, and a post-baking unit 47are, for example, eight-tiered in order from the bottom.

At the center portion of the interface section 5, for example, a wafercarrier 50 is provided as shown in FIG. 1. The wafer carrier 50 isconfigured to be freely movable in the X-direction (the top-to-bottomdirection in FIG. 1) and the Z-direction (the vertical direction) andalso freely rotatable in a O-direction (a direction of rotation aroundthe X-axis). The wafer carrier 50 can access the extension and coolingunit 41, the extension unit 42, and an edge exposure unit 51 included inthe fourth processing unit group G4 and the aligner 4 and carry thewafer W to each of them.

Next, the configuration of the aforementioned solvent supply unit 19will be described in detail. As shown in FIGS. 4 and 5, at the centerportion in a casing 19 a of the solvent supply unit 19, a chuck 60 forholding the wafer W thereon is provided. A holding surface 60 a beingthe upper surface of the chuck 60 is formed in a circle having almostthe same diameter as that of the wafer W. The holding surface 60 a ofthe chuck 60 is provided with a plurality of suction holes, not shown,so that suction through the suction holes can suck the wafer W onto theholding surface 60 a. The chuck 60 is provided with a raising andlowering drive unit 61 such as a cylinder which can move the holdingsurface 60 a of the chuck 60 up and down to transfer the wafer W to/fromthe main carrier unit 13.

Peltier elements 62 are built in the holding surface 60 a of the chuck60. The Peltier elements 62 are evenly arranged within the holdingsurface 60 a. A power supply 63 to the Peltier elements 62 is controlledby a temperature controller 64. The temperature controller 64 varies theamount of power supply to the Peltier elements 62 to adjust thetemperature of the Peltier elements 62 so that the temperature of theholding surface 60 a of the chuck 60 can be set to a predeterminedtemperature. It should be noted that the Peltier elements 62, the powersupply 63, and the temperature controller 64 constitute atemperature-adjusting mechanism.

Around the chuck 60, for example, an exhaust cup 70 for exhausting gasis provided. The exhaust cup 70 is located, for example, below theholding surface 60 a of the chuck 60. The exhaust cup 70 has a doublestructure composed of, for example, an outer cup 71 and an inner cup 72which are cylindrical, and an exhaust path 73 is formed between theouter cup 71 and the inner cup 72. In the clearance between top ends ofthe outer cup 71 and the inner cup 72, an annular suction port 74 isopened and disposed along the peripheral portion of the holding surface60 a as shown in FIG. 5. To the clearance between bottom ends of theouter cup 71 and the inner cup 72, an exhaust pipe 75 is connected whichleads to an exhauster (not shown) located outside the solvent supplyunit 19 and can exhaust the atmosphere above the chuck 60 through thesuction port 74 as necessary.

As shown in FIG. 5, on the side of the exhaust cup 70 on the negativedirection side in an X-direction (an upper direction in FIG. 5), a rail80 is provided along a Y-direction (a right-to-left direction in FIG.5). The rail 80 is provided, for example, from the outside on one endside to the outside on the other end side of the exhaust cup 70. On therail 80, an arm 81 is provided which is freely movable on the rail 80 bymeans of a drive unit 82. On the arm 81, a solvent supply nozzle 83 as anozzle for discharging a solvent gas onto the wafer W is held.Accordingly, the solvent supply nozzle 83 can move along the rail 80from the outside on the one end side of the exhaust cup 70, passing overthe chuck 60, to the outside on the other end side of the exhaust cup70. The movement of the solvent supply nozzle 83 is controlled, forexample, by a drive controller 84 for controlling the motion of thedrive unit 82. The drive controller 84 can move the solvent supplynozzle 83 in the Y-direction at a predetermined speed. The drive unit 82includes, for example, a cylinder for moving the arm 81 up and down andcan adjust the height of the solvent supply nozzle 83. It should benoted that the rail 80, the arm 81, the drive unit 82, and the drivecontroller 84 constitute a moving mechanism in this embodiment.

This solvent supply nozzle 83 has an elongated shape along theX-direction having, for example, a length longer than the diameter ofthe wafer W. The lower surface of the solvent supply nozzle 83 is formedwith a discharge portion 85 from one end portion to the other endportion in its longitudinal direction as shown in FIG. 6. The dischargeportion 85 is formed with a plurality of circular discharge ports 86along the longitudinal direction of the solvent supply nozzle 83. Asshown in FIG. 4, for example, to the upper portion of the solvent supplynozzle 83, a solvent supply pipe 88 is connected which communicates witha solvent gas supply source 87. The solvent supply nozzle 83 canintroduce a solvent gas from the upper portion, pass the solvent gasthrough the inside, and uniformly discharge the solvent gas downwardfrom the discharge ports 86 in the lower surface.

The solvent gas supply source 87 includes, for example, a storage tank90 communicating with the solvent supply pipe 88 and storing a liquidsolvent, and a nitrogen gas supply pipe 91 for supplying an inertnitrogen gas into the storage tank 90. Supply of the nitrogen gasthrough the nitrogen gas supply pipe 91 into the liquid solvent in thestorage tank 90 sends with pressure the solvent gas evaporating insidethe storage tank 90 into the solvent supply pipe 88, whereby the solventgas passes through the solvent supply pipe 88 to be supplied to thesolvent supply nozzle 83. The usable solvents include, for example,acetone, propylene glycol monomethyl ether acetate (PGMEA), andN-methyl-2-pyrrolidinone (NMP).

The solvent supply pipe 88 is provided with a flow rate sensor 92 fordetecting the flow rate of the solvent gas and a valve 93 for adjustingthe flow rate. The detection result detected by the flow rate sensor 92is outputted to a flow rate controller 94, so that the flow ratecontroller 94 can adjust the opening/closing degree of the valve 93based on the detection result to set the flow rate of the solvent gasdischarged from the solvent supply nozzle 83 to a predetermined flowrate.

The solvent supply unit 19 is configured as described above. Next, theconfiguration of the aforementioned heating units 35 and 46 will bedescribed. For example, the heating unit 35 has, in a casing 35 a, aheating plate 100 for heating the wafer W mounted thereon as shown inFIG. 7. The heating plate 100 incorporates a heater 101 which generatesheat by supply of power. A power supply 102 to the heater 101 iscontrolled by a heater controller 103 so that the heater controller 103can adjust the amount of heat generation by the heater 101 to controlthe temperature of the heating plate 100.

At the center portion of the heating plate 100, through holes 104 areformed which vertically penetrate the heating plate 100. In the throughholes 104, raising and lowering pins 105 are inserted from below. Theraising and lowering pins 105 are raised and lowered by means of araising and lowering unit 106 to freely protrude from the surface of theheating plate 100. Accordingly, the raising and lowering pins 105 canraise the wafer W to transfer the wafer W, for example, between the maincarrier unit 13 and the heating plate 100. Note that the heating unit 46has the same configuration as that of the heating unit 35, and thereforethe description thereof will be omitted.

Next, the processing process in the coating and developing treatmentapparatus 1 including the solvent supply unit 19 and the heating unit 35configured as described above will be described.

First, one unprocessed wafer W is taken out of the cassette C by thewafer carrier 7 and carried to the extension unit 32 included in thethird processing unit group G3. The wafer is then carried by the maincarrier unit 13 into the adhesion unit 31 where, for example, HMDS forenhancing adhesion of the resist solution is applied to the wafer W. Thewafer W is then carried to the cooling unit 30 to be cooled to apredetermined temperature, and thereafter carried to the resist coatingunit 17. In the resist coating unit 17, the resist solution is appliedonto the wafer W to form a resist film as a treatment film.

The wafer W formed with the resist film thereon is carried by the maincarrier unit 13 to the pre-baking unit 33 and the extension and coolingunit 41 in order, and carried by the wafer carrier 50 to the edgeexposure unit 51 and the aligner 4 in order so that the wafer W issubjected to predetermined processing or treatment in each of the units.The wafer W for which exposure processing has been finished in thealigner 4 is carried by the wafer carrier 50 to the extension unit 42,then subjected to predetermined processing in the post-exposure bakingunit 44 and the cooling unit 43, and thereafter carried to thedeveloping treatment unit 18 where the wafer W is subjected todeveloping treatment. At this time, the projections and depressions asshown in FIG. 13 are formed on the surface of the resist film on thewafer W. FIG. 8 is a flowchart showing the outline of the followingprocessing process.

The wafer W for which the developing treatment has been completed iscarried to the solvent supply unit 19. The wafer W carried to thesolvent supply unit 19 is first held on the holding surface 60 a of thechuck 60 maintained at a predetermined preset temperature, for example,23° C. being room temperature. This state is maintained for apredetermined period so that the wafer W is temperature-adjusted at 23°C. (step S1 in FIG. 8). During this period, exhaust of gas from theexhaust cup 70 is being performed so that the solvent supply unit 19 ispurged.

When the temperature of the wafer W is adjusted after a lapse of thepredetermined period, the solvent supply nozzle 83 is moved from theoutside of the exhaust cup 70 to above one end of the wafer W, forexample, a position above the wafer W on the positive direction side inthe Y-direction. Then, for example, the exhaust of gas from the exhaustcup 70 is temporarily stopped, and the solvent supply nozzle 83 thenbegins to discharge the solvent gas at a fixed flow rate (step S2 inFIG. 8). In this event, the solvent gas is supplied to a predeterminedregion on the one end side of the wafer surface. When the solvent supplynozzle 83 begins to discharge the solvent gas, the solvent supply nozzle83 moves at a fixed speed toward the other end side of the wafer W, thatis, the negative direction side in the Y-direction. Along with themovement, the supply region of the solvent gas on the wafer surface alsomoves to the negative direction side in the Y-direction. Once thesolvent supply nozzle 83 has moved to a position above the end of thewafer W on the negative direction side in the Y-direction, the solventsupply nozzle 83 turns back and moves this time from the other end sideto the one end side. In this manner, the solvent supply nozzle 83reciprocates above the wafer W to thereby supply the solvent gas ontothe surface of the resist film on the wafer W.

When the solvent gas is supplied onto the surface of the resist film insuch a manner, the surface of the resist film R absorbs the solvent gasso that only the surface of the resist film R dissolves and swells. Notethat for setting the moving speed and the discharge amount of thesolvent supply nozzle 83, values are used which are previouslycalculated by an experiment or the like so that only the surface of theresist film R dissolves.

After completion of the reciprocation of the solvent supply nozzle 83,the supply of the solvent gas is stopped, and exhaust of gas from theexhaust cup 70 is performed again. The wafer W is transferred from thechuck 60 to the main carrier unit 13 and carried to the heating unit 35.

The wafer W carried to the heating unit 35 is transferred to the raisingand lowering pins 105 which have been raised and waiting, and mounted onthe heating plate 100. The heating plate 100 is maintained at apredetermined temperature, for example, about 110° C., and the wafer Wis heated on the heating plate 100 for a predetermined period. Theheating for the predetermined period allows the solvent gas in theresist film R to evaporate, whereby the resist film R is heat-shrunk(step S3 in FIG. 8). Thus, the resist film R is returned to thethickness before the solvent gas supply as shown in FIG. 9.

The wafer W for which the heat-drying has been completed is carried outof the heating unit 35 by the main carrier unit 13 and cooled in thecooling unit 43, and then carried to the post-baking unit 47 and thecooling unit 30 in order in each of which the wafer W is subjected topredetermined processing. The wafer W is then returned to the cassette Cthrough the extension unit 32, thus completing a series ofphotolithography processes for the wafer W.

According to the above-described embodiment, the solvent supply unit 19having the solvent supply nozzle 83 is provided in the coating anddeveloping treatment system 1, so that the solvent gas can be suppliedto the surface of the resist film R after the developing treatment todissolve and swell the surface of the resist film R so as to smooth it.The heating unit 35 is also provided in the coating and developingtreatment system 1, and thus can heat the wafer W after the supply ofthe solvent gas to the resist film R to volatilize the excess solventcontained in the resist film R. As a result of this, the projections anddepressions formed on the surface of the resist film R can be leveled toimprove the surface roughness of the resist film R. During thesubsequent etching treatment, the base film is evenly etched, whereby acircuit pattern in a predetermined shape is formed on the wafer W.

Since the solvent supply nozzle 83 is configured to be movable withrespect to the wafer W in the solvent supply unit 19, the solvent supplynozzle 83 can move above the wafer W while supplying the solvent gas tothereby uniformly supply the solvent gas in an appropriate amount to theentire surface of the resist film R.

The Peltier elements 62 are provided in the chuck 60 in the solventsupply unit 19 to adjust the temperature of the wafer W to 23° C. beforethe supply of the solvent gas and thus can bring the wafer W to theoptimum temperature at which the surface of the resist film R dissolvesand uniform the temperature within the wafer W. This allows the surfaceof the resist film R to preferably dissolve.

While the solvent supply nozzle 83 reciprocates above the wafer W tosupply the solvent gas to the resist film R in the above-describedembodiment, the solvent gas may be supplied only on the forward path orthe backward path of the solvent supply nozzle 83. It is also suitableto supply the solvent gas on the forward path, then rotate the wafer W apredetermined angle, for example, 90 degrees, and thereafter supply thesolvent gas on the backward path. In this case, the supply may beperformed by providing a rotation mechanism on the chuck 60.

While the temperature adjustment before the supply of the solvent gas isperformed in the solvent supply unit 19 in the above-describedembodiment, the temperature adjustment may be performed, for example, inthe cooling units 30, 40, and 43. In this case, the wafer W after thedeveloping treatment is temporarily carried to the cooling unit wherethe wafer W is temperature-adjusted to 23° C. and then carried to thesolvent supply unit 19.

While the heating of the wafer W after the supply of the solvent gas isperformed in the heating unit 35 in the above-described embodiment, aheating mechanism may be incorporated in the solvent supply unit 19 sothat the heating of the wafer W may be performed in the solvent supplyunit 19. In this case, for example, a heat generator 110 such as aheater is built in the chuck 60 in the solvent supply unit 19 as shownin FIG. 10. The heat generator 110 generates heat, for example, bysupply of power from a power supply 111, the supply amount from thepower supply 111 being controlled by a temperature controller 112. Thesolvent gas is supplied to the wafer W in the solvent supply unit 19,and the wafer W is then heated in the same solvent supply unit 19. Inthis case, the supply of the solvent gas and the heating can beperformed in the same unit to improve the treatment efficiency of thewafer W. It should be noted that the heating mechanism is composed of,for example, the chuck 60, the heat generator 110, the power supply 111,and the temperature controller 112.

Further, as the above-described heating unit 35, a heating and coolingunit may be used which also includes a cooling function. In this case,the wafer W which has been heated and raised in temperature can becooled immediately.

Further, while the developing treatment and the supply treatment of thesolvent gas are performed in the separate units in the above-describedembodiment, they may be performed in the same unit. For example, adeveloping treatment mechanism may be incorporated in the solvent supplyunit 19. In this case, for example, a developing solution supply nozzle120 for supplying a developing solution to the wafer W and a cleaningnozzle 121 for supplying a cleaning solution the wafer W are provided,in addition to the solvent supply nozzle 83, in the solvent supply unit19 as shown in FIG. 11. For example, the developing solution supplynozzle 120 is held, similarly to the solvent supply nozzle 83, on an armwhich is freely movable on the rail 80. The cleaning nozzle 121 is heldon a holding arm 125 which pivots, for example, about the axis of avertical shaft 124 provided outside a later-described exhaust cup 123,so that the cleaning nozzle 121 can freely approach to/retreat from aposition above the wafer W from/to the outside of the exhaust cup 123.Further, a rotation drive unit 126 is attached to the chuck 60 as shownin FIG. 12 to be able to rotate the wafer W held on the chuck 60 at apredetermined speed. The exhaust cup 123 is formed in a manner tosurround the periphery of the chuck 60 so as to receive, for example,the developing solution scattering from the top of the wafer W. Notethat the remaining configuration is the same as that of theabove-described solvent supply unit 19 and therefore the descriptionthereof is omitted. It should be noted that the developing treatmentmechanism in this example is composed of, for example, the developingsolution supply nozzle 120, the chuck 60, and the exhaust cup 123.

In the wafer processing, the wafer W for which the post-exposure bakingand the cooling have been completed is carried to the solvent supplyunit 19 where the wafer W is held on the chuck 60. When the wafer W isheld on the chuck 60, the developing solution supply nozzle 120 movesfrom a position above the one end side to a position above the other endside while supplying the developing solution, whereby the developingsolution is supplied on the entire surface of the wafer W. After thedeveloping solution is placed on the wafer W, standstill development isperformed during a predetermined period. Thereafter, the wafer W isrotated, and the cleaning nozzle 121 supplies the cleaning solution ontothe wafer W to clean the wafer W. Upon completion of the cleaning, thewafer W is rotated at a high speed to be dried. When the wafer W isdried with which a series of steps of the developing treatment has beencompleted, the solvent supply nozzle 83 supplies the solvent gas to thewafer W as described above to improve the surface roughness of theresist film R. In this case, the developing treatment and the supplytreatment of the solvent can be performed in the same unit to omit thecarriage time of the wafer W, resulting in improved efficiency oftreating the wafer W. Note that while the developing treatment mechanismis incorporated in the solvent supply unit 19 in this case, a solventsupply mechanism such as the solvent supply nozzle 83 may beincorporated in the developing treatment units 18 and 20.

From the experiment actually carried out by the inventor, the result ofthe above-described smoothing performed for the resist pattern formed bythe photolithography process shows that both LER (Line Edge Roughness)and LWR (Line Width Roughness) could be suppressed to lower values thanthose in the case without smoothing.

As one particular example, the line widths, LWR, before the smoothingtreatment and after the smoothing treatment, for example, for apatterned resist film (UV135 4100A Barc: AR-5 600A) formed on a siliconwafer were as those shown in FIG. 13. Note that the solvent gas used atthat time was a solvent vapor of acetone. The temperature of the waferwas 23° C., and the solvent concentration was 4.0 L. To supply thesolvent vapor of acetone to the wafer, the solvent supply nozzle 83 wasscanned over the wafer while supplying the solvent gas, where the scanspeed at that time was set to 40 mm/sec.

As can be seen from the result in FIG. 13, the line width (CD) of thepattern slightly decreases after the smoothing treatment has beenperformed, but the LWR is significantly improved. This shows that thesurface of the resist pattern formed on the wafer has been smoothed.

Note that when the solvent supply nozzle 83 supplies the solvent gas toa substrate, it is more preferable that a gap between the nozzledischarge ports 86 of the solvent supply nozzle 83 and the wafer W isnarrower. Besides, the appropriate speed of the solvent supply nozzle 83when scanning is 15 mm/sec to 250 mm/sec.

Where the solvent gas is supplied from the discharge ports 86 of thesolvent supply nozzle 83, it is preferable to attach partition plates 89a and 89 b to the front and rear of the discharge portion 85 of thesolvent supply nozzle 83. These partition plates 89 a and 89 b form akind of partition walls at the front and the rear of the nozzle in itsrelative moving direction, and thus can prevent the solvent gas suppliedfrom the discharge ports 86 from diffusing in the back and forthdirection and supply the solvent gas uniformly over the entire surfaceof the wafer W along with the relative movement of the nozzle. It shouldbe noted that a distance d between the partition plates 89 a and 89 b isset, for example, to about 20 mm, and a height (the length from thelower end of the main body of the solvent supply nozzle 83) h of thepartition plates 89 a and 89 b is set to about 10 mm.

The method of supplying the solvent gas is not limited to a method ofrelatively moving the solvent supply nozzle 83 as described above tothereby sequentially move the solvent supply region so as to supply thesolvent gas over the entire surface of the wafer W as a result. A methodmay also be employed which supplies the solvent gas from an upper faceto the entire surface of the wafer W mounted on a mounting table 152 ina treatment container 151 as shown in FIG. 15.

This treatment container 151 comprises a baffle board 154 formed withmany holes 153 at the upper face in the container, so that when thesolvent gas is supplied from a solvent gas supply unit 155 located ontop of the container, the solvent gas is uniformly supplied through thebaffle board 154 onto the entire upper surface of the wafer W. Note thatthe atmosphere in the treatment container 151 is exhausted by an exhaustpump 157 to the outside of the container through an exhaust port 156provided at the bottom of the container.

Incidentally, it has been found from the investigation by the inventorthat an ArF resist tends to be harder to smooth than a KrF resist eventhough the solvent gas is supplied. This is conceivably caused by partof a portion called a protecting group existing in the ArF resistinhibiting the solubility thereof. The protecting groups include, forexample, a lactone group. Hence, such a protecting group is previouslydecomposed before the supply of the solvent gas, so that the resist canbe smoothly smoothed by the supply of the solvent gas.

Techniques of decomposing such a dissolution inhibiting protecting groupinclude, for example, irradiation of UV or electron beam. As anapparatus for performing a so-called surface modification treatment, forexample, a treatment unit 161 can be proposed, for example, as shown inFIG. 16.

This treatment unit 161 has a rotary mounting table 163 in a treatmentcontainer 162 and has an irradiation unit 164 for ultraviolet orelectron beam on the upper face in the container. The irradiation unit164 can irradiate the wafer W with the ultraviolet or electrode beamwith the wafer W mounted on the rotary mounting table 162 being rotatedto thereby modify the quality of the treatment film on the surface ofthe wafer W, for example, the resist film so as to decompose thedissolution inhibiting protecting group. Further, the wafer W can beuniformly irradiated with the ultraviolet or electron beam since theirradiation is performed with the wafer W being rotated.

The supply of the above-described solvent gas after decomposition of thedissolution inhibiting protecting group in the treatment film on thewafer W in such a manner allows even the ArF resist used for the resistfilm to be smoothed preferably. In addition, performance of such aso-called pre-treatment extends the range of solvent choices becausesmoothing can be performed using even a solvent which had no effectbefore. The extension of the range of solvent choices allows selectionof a solvent suitable for each ArF resist and also offers advantage inthe performance of controlling the shape and so on.

The above embodiment illustrates one example of the present invention,and the present invention is not limited to the embodiment but can takevarious forms. For example, while the plurality of circular dischargeports 86 are formed in the discharge portion 85 of the solvent supplynozzle 83 in this embodiment, a discharge port in a long slit shape atleast longer than the diameter of the wafer W may be formed. Further,while the solvent supply nozzle 83 is moved with respect to the wafer Win the solvent supply unit 19, the wafer W side may be moved.Furthermore, while this embodiment relates to treatment of the wafer W,the present invention is also applicable to other substrates such as anLCD substrate, a glass substrate for photomask, and so on.

INDUSTRIAL APPLICABILITY

The present invention can improve surface roughness of a treatment filmsuch as a resist film formed on various kinds of substrates such as asemiconductor wafer, a flat display substrate, and so on. Accordingly,the present invention is useful in manufacturing process of asemiconductor device, a substrate for various kinds of displays, and asubstrate for photomask.

1. A treatment apparatus for treating a substrate on a surface of whicha treatment film has been formed and subjected to exposure processingand developing treatment, comprising: a nozzle for supplying a solventgas of the treatment film to the surface of the treatment film on thesubstrate; and a moving mechanism for moving said nozzle which issupplying the solvent gas, relative to the substrate, said nozzle has anelongated discharge portion at least longer than a diameter of thesubstrate and partition plates at a front and a rear in the movingdirection of the nozzle.
 2. The substrate treatment apparatus as setforth in claim 1, further comprising: a temperature-adjusting mechanismfor adjusting a temperature of the substrate.
 3. The substrate treatmentapparatus as set forth in claim 1, further comprising: a heatingmechanism for heating the substrate.
 4. The substrate treatmentapparatus as set forth in claim 1, further comprising: a developingtreatment mechanism for performing developing treatment for thesubstrate.
 5. The substrate treatment apparatus as set forth in claim 1,wherein said partition plates are provided extending downward from bothends of the elongated discharge portion.